Method · ELLIPS
Spectroscopic ellipsometry in the Netherlands
Optical constants and thickness of suitable films through an optical model. What it answers, what it cannot establish on its own, what a laboratory will ask, and how many Dutch facilities publish it.
What it answers
- How thick is a transparent or semi-transparent film, and what are its refractive index and extinction coefficient?
- How uniform is the thickness across a wafer or substrate?
- Did a process step change the optical constants of a layer?
What it cannot establish alone
Before you contact a laboratory
What a laboratory will ask.
A laboratory can say whether it can help only when these are known. Unknowns are fine; say so.
A question a laboratory can answer
We grow 100–150 nm silicon oxide films on silicon and need thickness and refractive index at 633 nm, measured at nine points across a 100 mm wafer.
Potential Dutch facilities
8 facilities publish spectroscopic ellipsometry capability in Delft, Eindhoven, Amsterdam, Groningen and Noordwijk.
Leads are based on published capabilities; current suitability and availability must be confirmed with the laboratory.
Describe your sample and question. The first answer is free and needs no account; laboratory names are shown in a free workspace.
Problems where it helps
- Thin-film thickness: choosing a measurementEllipsometry, X-ray reflectivity or a cross-section? How film type, thickness range and stack decide the measurement, and what to prepare.